ASTM-E1438:2019 Edition
$29.79
E1438-11(2019) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
Published By | Publication Date | Number of Pages |
ASTM | 2019 | 3 |
ASTM E1438-11-Reapproved2019
Active Standard: Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1438
Scope
1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens (both organic and inorganic). This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens.
1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
Keywords
ICS Code
ICS Number Code 29.045 (Semiconducting materials)
DOI: 10.1520/E1438-11R19