ASTM-F1152:2002 Edition
$35.75
F1152-02 Standard Test Method for Dimensions of Notches on Silicon Wafers (Withdrawn 2003)
Published By | Publication Date | Number of Pages |
ASTM | 2002 | 4 |
ASTM F1152-02
Withdrawn Standard: Standard Test Method for Dimensions of Notches on Silicon Wafers (Withdrawn 2003)
ASTM F1152
Scope
This standard was transferred to SEMI (www.semi.org) May 2003
1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits.
1.2 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.
1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Keywords
notch; notch dimension; optical comparator; silicon; wafer
ICS Code
ICS Number Code 29.045 (Semiconducting materials)
DOI: 10.1520/F1152-02