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ASTM-F1259:1989 Edition

ASTM-F1259:1989 Edition

$35.75

F1259-89 Guide for Design of Flat, Straight-Line Test Structures for Detecting Metallization Open-Circuit or Resistance-Increase Failure Due to Electromigration

Published By Publication Date Number of Pages
ASTM 1989 2
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ASTM F1259-89

Withdrawn Standard: Guide for Design of Flat, Straight-Line Test Structures for Detecting Metallization Open-Circuit or Resistance-Increase Failure Due to Electromigration

ASTM F1259

Scope

1.1 This guide covers recommended design features for test structures used in accelerated stress tests, as described in Test Method F1260, to characterize the failure distribution of interconnect metallizations that fail due to electromigration.

1.2 The guide is restricted to structures with a straight test line on a flat surface that are used to detect failures due to an open-circuit or a percent-increase in resistance of the test line.

1.3 This guide is not intended for test structures used to detect random defects in a metallization line.

1.4 Metallizations tested and characterized are those that are used in microelectronic circuits and devices.

Keywords

Accelerated aging/testing-semiconductors; Defects-semiconductors; Electrical conductors-semiconductors; Electromigration; Failure end point-electronic components/devices; Metallization; Microelectronic device processing; Resistance-failure; Silicon-semiconductor applications; Straight-line testing; Test structures; Time to failure; Voltage; design of flat straight-line test structures (for detecting; metallization open-circuit/resistance to increase failure due to; electromigration), guide

ICS Code

ICS Number Code 29.050 (Superconductivity and conducting materials)

DOI:

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