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ASTM-F2113:2007 Edition

ASTM-F2113:2007 Edition

$35.75

F2113-01(2007) Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

Published By Publication Date Number of Pages
ASTM 2007 2
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1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

PDF Catalog

PDF Pages PDF Title
1 Scope
Referenced Documents
Terminology
Impurities
Classification
Sampling
2 Analytical Methods
Certification
Keywords
TABLE 1

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