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BS EN 62047-18:2013

$102.76

Semiconductor devices. Micro-electromechanical devices – Bend testing methods of thin film materials

Published By Publication Date Number of Pages
BSI 2013 18
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This part of IEC 62047 specifies the method for bend testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 µm and 10 µm. Thin films are used as main structural materials for Micro-electromechanical Systems (abbreviated as MEMS in this document) and micromachines.

The main structural materials for MEMS, micromachines, etc., have special features, such as a few micron meter size, material fabrication by deposition, photolithography, and/ or non-mechanical machining test piece. This International Standard specifies the bend testing and test piece shape for micro-sized smooth cantilever type test pieces, which enables a guarantee of accuracy corresponding to the special features.

PDF Catalog

PDF Pages PDF Title
6 English
CONTENTS
7 1 Scope
2 Normative references
8 3 Symbols and designations
4 Test piece
4.1 Design of test piece
Figures
Figure 1 – Schematically shown test piece with substrate
Tables
Table 1 – Symbols and designation of test piece
9 4.2 Preparation of test piece
4.3 Test piece width and thickness
4.4 Storage prior to testing
5 Testing method
5.1 General
10 Figure 2 – Measurement method
11 5.2 Method for mounting of test piece
5.3 Method for loading
5.4 Speed of testing
5.5 Displacement measurement
5.6 Test environment
5.7 Data analysis
12 6 Test report
5.8 Material for test pieces
13 Annex A (informative) Precautions for the test piece/substrate interface
Figure A.1 – Finishing angle of substrate contact area with test piece
14 Annex B (informative) Precautions necessary for the force displacement relationship
Figure B.1 – Cantilever type bend test piece of metallic glass in accordance with IEC 62047-18
15 Figure B.2 – Typical example of relationship between force and displacement
BS EN 62047-18:2013
$102.76