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BS EN 62047-9:2011:2013 Edition

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Semiconductor devices. Micro-electromechanical devices – Wafer to wafer bonding strength measurement for MEMS

Published By Publication Date Number of Pages
BSI 2013 30
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This standard describes bonding strength measurement method of wafer to wafer bonding, type of bonding process such as silicon to silicon fusion bonding, silicon to glass anodic bonding, etc., and applicable structure size during MEMS processing/assembly. The applicable wafer thickness is in the range of 10 µm to several millimeters.

BS EN 62047-9:2011
$142.49