BSI PD IEC TS 62607-8-1:2020
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Nanomanufacturing. Key control characteristics – Nano-enabled metal-oxide interfacial devices. Test method for defect states by thermally stimulated current
Published By | Publication Date | Number of Pages |
BSI | 2020 | 32 |
There are two types of thermally stimulated current (TSC) measurement methods, classified by the origin of the current. One is generated by the detrapping of charges. The other one is generated by depolarization. This part of IEC 62607 focuses on the former method, and specifies the measurement method to be developed for determining defect states of nanoenabled metal-oxide interfacial devices.
This document includes:
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outlines of the experimental procedures used to measure TSC,
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methods of interpretation of results and discussion of data analysis, and
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case studies.
PDF Catalog
PDF Pages | PDF Title |
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2 | undefined |
4 | CONTENTS |
6 | FOREWORD |
8 | INTRODUCTION |
9 | 1 Scope 2 Normative references 3 Terms, definitions, and abbreviated terms 3.1 Terms and definitions |
10 | 3.2 Abbreviated terms 4 Measurement of TSC 4.1 General 4.2 Sample preparation 4.3 Experimental procedures Figures Figure 1 – Structure of TSC measurement device |
11 | 5 Reporting data 6 Data analysis / interpretation of results 6.1 General Figure 2 – Visualization of TSC measurement sequence Tables Table 1 – TSC measurement sequence steps and parameters |
12 | 6.2 Peak method [1] 6.3 Tstart–Tstop method [2] [3] 6.4 Initial rise method [4] |
13 | Annex A (informative)Case study A.1 TSC measurement of Au/GaAs (reference sample) A.1.1 General Figure A.1 – Photos of (a) the Au electrode configurationon GaAs reference sample, and (b) sample setting |
14 | Figure A.2 – Structure of TSC measurement device |
15 | Figure A.3 – TSC data comparison by samples Table A.1 – TSC measurement sequence steps and parameters / case study |
16 | A.1.2 Estimating activation energy of defect states by peak method Figure A.4 – TSC data comparison by heating rate |
18 | Figure A.5 – Determination of TSC peak positions using the second derivative curves |
19 | Figure A.6 – Arrhenius plots of (a) ln(Tm2/β) vs. 1/Tm and (b) ln(Tm4/β) vs. 1/Tm Table A.2 – Activation energies of T1 to T6 for y = ln (Tm2/β) Table A.3 – Activation energies of T1 to T6 for y = ln (Tm4/β) |
20 | A.2 TSC measurement of Ir/Ta2O5 A.2.1 General Table A.4 – TSC measurement sequence steps and parameters / case study (2) |
21 | Figure A.7 – TSC data comparison by samples Table A.5 – Conditions of Ta2O5 sputtering deposition |
22 | Figure A.8 – TSC data comparison of Sample A by heating rate Figure A.9 – TSC data comparison of Sample B by heating rate |
23 | Figure A.10 – TSC data comparison of Sample C by heating rate |
24 | Figure A.11 – TSC data comparison by carrier injection method (Samples A, B and C) |
25 | A.2.2 Estimating activation energy of defect states by Peak method Figure A.12 – Samples A, B and C: Determination of TSC peak positionsusing the second derivative curves |
26 | Figure A.13 – Arrhenius plots for TA1, Sample A Table A.6 – Activation energies of Samples A, B and C |
28 | Annex B (informative)Possible methods to analyse TSC spectra B.1 Peak method B.2 Tstart–Tstop method Figure B.1 – Peak method |
29 | B.3 Initial rise method Figure B.2 – Tstart–Tstop method |
30 | Figure B.3 – Determination of trap level energy through initial rise method |
31 | Bibliography |