This part of IEC 62607 specifies the test method for determining the resistivity and the contact resistance of an individual CNT and the dependability of the measurement.<\/p>\n
This document includes:<\/p>\n
outlines of the experimental procedures used to measure resistance of carbon nanotubes,<\/p>\n<\/li>\n
methods of interpretation of results and discussion of data analysis, and<\/p>\n<\/li>\n
case studies.<\/p>\n<\/li>\n<\/ul>\n
| PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
|---|---|---|---|---|---|---|---|
| 2<\/td>\n | undefined <\/td>\n<\/tr>\n | ||||||
| 4<\/td>\n | CONTENTS <\/td>\n<\/tr>\n | ||||||
| 5<\/td>\n | FOREWORD <\/td>\n<\/tr>\n | ||||||
| 7<\/td>\n | INTRODUCTION <\/td>\n<\/tr>\n | ||||||
| 8<\/td>\n | 1 Scope 2 Normative references 3 Terms, definitions, and abbreviated terms 3.1 Terms and definitions <\/td>\n<\/tr>\n | ||||||
| 10<\/td>\n | 3.2 Abbreviated terms 4 Measurement of resistance 4.1 General 4.2 Method for processing and fabrication of DUT 4.3 4-probe measurement <\/td>\n<\/tr>\n | ||||||
| 11<\/td>\n | 5 Reporting data Figures Figure 1 \u2013 4-probe measurement in a SEM chamber <\/td>\n<\/tr>\n | ||||||
| 12<\/td>\n | 6 Data analysis \/ interpretation of results (Annex A) 6.1 General 6.2 Measurement error Figure 2 \u2013 A crooked\/curved CNT under measurement <\/td>\n<\/tr>\n | ||||||
| 13<\/td>\n | 6.3 Need to prepare the proper electric probing circuit 6.4 Need to prepare the proper substrate and electric contact 6.5 Dynamic range 6.6 Current density 6.7 Voltage bias of the substrate 6.8 Measurement in vacuum Figure 3 \u2013 I-V measurement of a sufficiently straight CNT <\/td>\n<\/tr>\n | ||||||
| 14<\/td>\n | Annex A (informative)Case study A.1 4-probe measurement of MWCNT A.1.1 I-V measurements of MWCNT Figure A.1 \u2013 I-V measurements of a CNT with different lengths, L <\/td>\n<\/tr>\n | ||||||
| 15<\/td>\n | Figure A.2 \u2013 I-V relationships for different CNT lengths \u2013 2-probe measurement Figure A.3 \u2013 I-V relationships for different CNT lengths \u20132-probe measurement (0 to 0,5 V) <\/td>\n<\/tr>\n | ||||||
| 16<\/td>\n | A.1.2 Fabrication process information of MWCNT and DUT Figure A.4 \u2013 I-V relationships for different CNT lengths \u2013 4-probe measurement Figure A.5 \u2013 Resistance vs. CNT length <\/td>\n<\/tr>\n | ||||||
| 17<\/td>\n | A.2 4-probe measurement of SWCNT A.2.1 I-V measurements of SWCNT Figure A.6 \u2013 I-V relationships of SWCNT <\/td>\n<\/tr>\n | ||||||
| 18<\/td>\n | Figure A.7 \u2013 Resistance vs. SWCNT length <\/td>\n<\/tr>\n | ||||||
| 19<\/td>\n | Figure A.8 \u2013 I-V relationships of SWCNT under the electron-beam exposure <\/td>\n<\/tr>\n | ||||||
| 20<\/td>\n | A.2.2 Fabrication process information of SWCNT and DUT Figure A.9 \u2013 Breakdown characteristics of SWCNT <\/td>\n<\/tr>\n | ||||||
| 21<\/td>\n | Bibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" Nanomanufacturing. Key control characteristics – Carbon nanotube materials. Test methods for determination of resistance of individual carbon nanotubes<\/b><\/p>\n |