{"id":290965,"date":"2024-10-19T19:45:04","date_gmt":"2024-10-19T19:45:04","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bs-iso-147062014\/"},"modified":"2024-10-25T16:46:08","modified_gmt":"2024-10-25T16:46:08","slug":"bs-iso-147062014","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bs-iso-147062014\/","title":{"rendered":"BS ISO 14706:2014"},"content":{"rendered":"

This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.<\/p>\n

The method is applicable to the following:<\/p>\n