BS ISO 22278:2020
$167.15
Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for crystalline quality of single-crystal thin film (wafer) using XRD method with parallel X-ray beam
| Published By | Publication Date | Number of Pages |
| BSI | 2020 | 38 |
This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 2 | National foreword |
| 6 | Foreword |
| 7 | Introduction |
| 9 | 1 Scope 2 Normative references 3 Terms and definitions |
| 11 | 4 Fundamentals 5 Devices and instruments 5.1 Schematic diagrams |
| 12 | 5.2 X-ray generator |
| 13 | 5.3 X-ray mirror 5.4 Monochromator 5.5 Sample attachment 5.6 Goniometer 5.7 Detector 5.8 Instrument calibration |
| 14 | 6 Preparation of sample 7 Test method and procedure 7.1 Optics alignment 7.2 Sample alignment |
| 15 | 7.3 Adjusting the initial position of goniometer 7.3.1 Symmetric diffraction |
| 17 | 7.3.2 Asymmetric diffraction 7.4 Microscopic position adjustment of goniometer (Φ and χ axes) and ω scan 7.4.1 Symmetric diffraction |
| 20 | 7.4.2 Asymmetric diffraction |
| 24 | 7.5 Crystalline quality measurement method of single-crystal wafer 7.5.1 General 7.5.2 Selecting the flat zone position of wafer |
| 25 | 7.5.3 Arranging the fixed size of the square 7.5.4 Measuring the FWHM value of RC 7.5.5 Interference effect by the wafer’s curvature 7.5.6 Doped epitaxy film on a single-crystal thin film substrate |
| 26 | 8 Data analysis 9 Test report |
| 28 | Annex A (informative) Example of d-spacing, 2θ, χ value (tilt angle) and relative ideal intensity of the symmetric and asymmetric diffraction on the SiC single-crystal thin film (wafer) |
| 30 | Annex B (informative) Determination of d-spacing, 2θ, χ value (tilt angle) and relative ideal intensity for the symmetric and asymmetric diffraction on the single-crystal thin film (wafer) |
| 34 | Annex C (informative) Results of interlaboratory test |
| 36 | Bibliography |
