{"id":418443,"date":"2024-10-20T06:21:02","date_gmt":"2024-10-20T06:21:02","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bsi-23-30442762-dc-2023\/"},"modified":"2024-10-26T11:51:14","modified_gmt":"2024-10-26T11:51:14","slug":"bsi-23-30442762-dc-2023","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bsi-23-30442762-dc-2023\/","title":{"rendered":"BSI 23\/30442762 DC 2023"},"content":{"rendered":"
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
---|---|---|---|---|---|---|---|
1<\/td>\n | 30442762-NC.pdf <\/td>\n<\/tr>\n | ||||||
3<\/td>\n | ISO_DIS 8181 ed.1 – id.82998 Enquiry PDF (en) (1).pdf <\/td>\n<\/tr>\n | ||||||
6<\/td>\n | Foreword <\/td>\n<\/tr>\n | ||||||
7<\/td>\n | Introduction <\/td>\n<\/tr>\n | ||||||
9<\/td>\n | 1 Scope 2 Normative references 3 Terms and definitions <\/td>\n<\/tr>\n | ||||||
10<\/td>\n | 4 Terms – Atomic layer deposition 4.1 General terms <\/td>\n<\/tr>\n | ||||||
11<\/td>\n | 4.2 Film growth of atomic layer deposition <\/td>\n<\/tr>\n | ||||||
12<\/td>\n | 4.3 Classification of atomic layer deposition <\/td>\n<\/tr>\n | ||||||
15<\/td>\n | Annex\u20acA (informative) Example of Schematic diagram for time separated ALD and spatial ALD <\/td>\n<\/tr>\n | ||||||
17<\/td>\n | Bibliography <\/td>\n<\/tr>\n | ||||||
18<\/td>\n | Index <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" BS ISO 8181. Atomic Layer Deposition. Terminology<\/b><\/p>\n |